Material, Electrical, and Optical Characterizations of High-K Sm2TiO5Dielectric Deposited on Polycrystalline Silicon
Author:
Publisher
Informa UK Limited
Subject
Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://www.tandfonline.com/doi/pdf/10.1080/00150193.2012.732460
Reference16 articles.
1. Hafnium Titanate bilayer structure multimetal dielectric nMOSCAPs
2. Atomic Layer Deposition of Lanthanum Oxide Films for High-κ Gate Dielectrics
3. Praseodymium silicate formed by postdeposition high-temperature annealing
4. Structural and electrical properties of electron beam gun evaporated Er2O3 insulator thin films
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