Lithography reticle scheduling in semiconductor manufacturing-Reference-Cited by-同舟云学术

Lithography reticle scheduling in semiconductor manufacturing

Published:2023-11-29 Issue: Volume: Page:1-19
ISSN:0305-215X
Container-title:Engineering Optimization
language:en
Short-container-title:Engineering Optimization

Author:

Lee Chia-Yen¹²,Wu Cheng-Man²,Hsu Chia-Yi³,Xie Hui-Hua³,Fang Yu-Hsueh¹

Affiliation:

1. Department of Information Management, National Taiwan University, Taipei, Taiwan

2. Institute of Manufacturing Information and Systems, National Cheng Kung University, Tainan City, Taiwan

3. Winbond Electronics Corporation, Taiwan

Funder

Ministry of Science and Technology, Taiwan

Publisher

Informa UK Limited

Subject

Applied Mathematics,Industrial and Manufacturing Engineering,Management Science and Operations Research,Control and Optimization,Computer Science Applications

Link

https://www.tandfonline.com/doi/pdf/10.1080/0305215X.2023.2285416

Reference34 articles.

1. Cycle-time improvements for photolithography process in semiconductor manufacturing

2. A memetic algorithm to solve an unrelated parallel machine scheduling problem with auxiliary resources in semiconductor manufacturing

4. A novel timetabling algorithm for a furnace process for semiconductor fabrication with constrained waiting and frequency-based setups

5. Overlay Error Compensation Using Advanced Process Control With Dynamically Adjusted Proportional-Integral R2R Controller

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Robust-optimization-guiding deep reinforcement learning for chemical material production scheduling;Computers & Chemical Engineering;2024-08

2. Multi-objective genetic algorithm embedded with reinforcement learning for petrochemical melt-flow-index production scheduling;Applied Soft Computing;2024-07

3. Perfect Tracking Control of Linear Sliders Using Sliding Mode Control with Uncertainty Estimation Mechanism;Machines;2024-03-22