Simultaneous removal of nitrate, hydrogen peroxide and phosphate in semiconductor acidic wastewater by zero-valent iron
Author:
Publisher
Informa UK Limited
Subject
General Medicine,Environmental Engineering
Link
http://www.tandfonline.com/doi/pdf/10.1080/10934529.2014.894841
Reference41 articles.
1. Application of struvite precipitation in treating ammonium nitrogen from semiconductor wastewater
2. Cement paste column for simultaneous removal of fluoride, phosphate, and nitrate in acidic wastewater
3. Fenton oxidation and sequencing batch reactor (SBR) treatments of high-strength semiconductor wastewater
4. Chemical and physical treatments of chemical mechanical polishing wastewater from semiconductor fabrication
5. Saving Energy and Resources on Surface Treatment. Technology of Reclaimation in Semiconductor and LCD Manufactory.
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