Effect of Excitation and Vibrational Temperature on the Dissociation of Nitrogen Molecules in Ar-N2Mixture RF Discharge
Author:
Publisher
Informa UK Limited
Subject
Spectroscopy,Atomic and Molecular Physics, and Optics,Analytical Chemistry
Link
http://www.tandfonline.com/doi/pdf/10.1080/00387010.2010.497527
Reference36 articles.
1. Progress in the analysis of the mechanisms of ion nitriding
2. Epitaxial Growth of GaN on Sapphire (0001) Substrates by Electron Cyclotron Resonance Molecular Beam Epitaxy
3. Ultrahigh vacuum arcjet nitrogen source for selected energy epitaxy of group III nitrides by molecular beam epitaxy
4. Grill , A.Cold Plasma in Materials Fabrication from Fundamental to Applications; IEEE Press : Fiscataway , NJ , U.S.A. , 1993 , p. 51 .
5. Electron-temperature dependence of nitrogen dissociation in 915 MHz ECR plasma
Cited by 13 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Determination of Electron Excitation Temperature in an RF-DC Hollow Cathode Nitrogen Plasma;Journal of Physics: Conference Series;2021-02-01
2. Langmuir probe and optical emission spectroscopy studies for RF magnetron sputtering during TiON thin film deposition;Chinese Journal of Physics;2020-12
3. Experimental studies of the spectral characteristics of a free glow discharge in the wavelength range of 340-440 nm;Journal of Physics: Conference Series;2020-12-01
4. Spatial and time resolved determination of the vibrational temperature in ignition sparks by variation of the dwell time;SN Applied Sciences;2020-06-30
5. Experimental characterization of a ns-pulsed micro-hollow cathode discharge (MHCD) array in a N2/Ar mixture;Plasma Sources Science and Technology;2019-03-08
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3