Virtual metrology in long batch processes using machine learning-Reference-Cited by-同舟云学术

Virtual metrology in long batch processes using machine learning

Published:2023-06-06 Issue:15 Volume:38 Page:1997-2008
ISSN:1042-6914
Container-title:Materials and Manufacturing Processes
language:en
Short-container-title:Materials and Manufacturing Processes

Author:

Guha Ritam¹^ORCID,Suresh Anirudh²,DeFrain Jared³,Deb Kalyanmoy⁴

Affiliation:

1. Computer Science and Engineering, Michigan State University, East Lansing, MI, USA

2. Mechanical Engineering, Michigan State University, East Lansing, USA

3. Information Technology, Hemlock Semiconductor Operations LLC, Hemlock, MI, USA

4. Electrical and Computer Engineering, Michigan State University, East Lansing, USA

Publisher

Informa UK Limited

Subject

Industrial and Manufacturing Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science

Link

https://www.tandfonline.com/doi/pdf/10.1080/10426914.2023.2220487

Reference30 articles.

1. Chang, Y.-J.; Kang, Y.; Hsu, C.-L.; Chang, C.-T.; Chan, T. Y. Virtual Metrology Technique for Semiconductor Manufacturing. In The 2006 IEEE International Joint Conference on Neural Network Proceedings, Vancouver, BC, Canada; IEEE, 2006; pp 5289–5293.

2. A virtual metrology system for semiconductor manufacturing

3. A Novel Virtual Metrology Scheme for Predicting CVD Thickness in Semiconductor Manufacturing

4. Developing an Automatic Virtual Metrology System

5. Adaptive Virtual Metrology Design for Semiconductor Dry Etching Process Through Locally Weighted Partial Least Squares

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