Characterisation of amorphous/nanocrystalline multilayer Si3N4–Si3N4/Si2N2O films prepared by alternately sputtering-Reference-Cited by-同舟云学术

Characterisation of amorphous/nanocrystalline multilayer Si3N4–Si3N4/Si2N2O films prepared by alternately sputtering

Published:2017-03-13 Issue:8 Volume:33 Page:633-641
ISSN:0267-0844
Container-title:Surface Engineering
language:en
Short-container-title:Surface Engineering

Author:

Liu Eryong¹,Pu Jibin¹,Zeng Zhixiang¹,Wang Yongxin¹,Zhao Wenjie¹

Affiliation:

1. Key Laboratory of Marine Materials and Related Technologies, Zhejiang Key Laboratory of Marine Materials and Protective Technologies, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo, China

Funder

National Basic Research Program of China

National Natural Science Foundation of China

Ningbo Municipal Innovation Team

Publisher

Informa UK Limited

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

https://www.tandfonline.com/doi/pdf/10.1080/02670844.2017.1292704

Reference37 articles.

1. Effect of Porosity and Microstructure on the Strength of Si3N4: Designed Microstructure for High Strength, High Thermal Shock Resistance, and Facile Machining

2. Dynamics and Morphology of Brittle Cracks: A Molecular-Dynamics Study of Silicon Nitride

3. Superhard nanocrystalline composite materials: The TiN/Si3N4 system

4. Strength, fracture toughness and microstructure of a selection of all-ceramic materials. Part I. Pressable and alumina glass-infiltrated ceramics

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