The chemical process for materials deposition in aqueous solution: a review-Reference-Cited by-同舟云学术

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The chemical process for materials deposition in aqueous solution: a review

Published:2022-12-02 Issue:10-12 Volume:38 Page:907-929
ISSN:0267-0844
Container-title:Surface Engineering
language:en
Short-container-title:Surface Engineering

Author:

Oliva A. I.¹^ORCID,González-Chan I. J.²,Várguez P. E.¹,Trejo-Ramos A. I.¹,Oliva-Avilés A. I.³^ORCID

Affiliation:

1. Centro de Investigación y de Estudios Avanzados del IPN Unidad Mérida. Depto. de Física Aplicada, Mérida, Mexico

2. Escuela de Diseño, Universidad Modelo, Mérida, Mexico

3. División de Ingeniería y Ciencias Exactas, Universidad Anáhuac Mayab, Mérida, Mexico

Funder

Laboratorio Nacional de Nano y Biomaterials

FOMIX-Yucatán

CONACYT

Publisher

SAGE Publications

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

https://www.tandfonline.com/doi/pdf/10.1080/02670844.2023.2187883

Reference214 articles.

1. Semiconductor and ceramic nanoparticle films deposited by chemical bath deposition

2. Über Verbindungen des Thiokarbamids und Xanthogenamids mit Salzen des einwertigen Kupfers

3. Über die Thiokarbamidverbindungen zweiwertiger Metallsalze

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Material selection and performance optimization strategies for a wearable friction nanogenerator (W-TENG);Journal of Materials Chemistry A;2023

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