Growth of hard metal films by deep oscillation magnetron sputtering
Author:
Affiliation:
1. Surface Engineering Laboratory, School of Materials Science and Engineering, Dalian University of Technology, Dalian, People’s Republic of China
Funder
National Key Research and Development Program of China
National Natural Science Foundation of China
Publisher
SAGE Publications
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
https://www.tandfonline.com/doi/pdf/10.1080/02670844.2023.2243000
Reference27 articles.
1. Extreme creep resistance in a microstructurally stable nanocrystalline alloy
2. Constrained minimal-interface structures in polycrystalline copper with extremely fine grains
3. On the film density using high power impulse magnetron sputtering
4. Effect of Pulsed Plasma Processing on Controlling Nanostructure And Properties of Thin Film/Coatings
5. Coalescence-controlled and coalescence-free growth regimes during deposition of pulsed metal vapor fluxes on insulating surfaces
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