Axial distribution of plasma fluctuations, plasma parameters, deposition rate and grain size during copper deposition-Reference-Cited by-同舟云学术

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Axial distribution of plasma fluctuations, plasma parameters, deposition rate and grain size during copper deposition

Published:2017-08-03 Issue:7-8 Volume:172 Page:545-554
ISSN:1042-0150
Container-title:Radiation Effects and Defects in Solids
language:en
Short-container-title:Radiation Effects and Defects in Solids

Author:

Gopikishan S.¹,Banerjee I.²,Pathak Anand³⁴,Mahapatra S. K.⁵

Affiliation:

1. Department of Physics, Birla Institute of Technology, Ranchi, India

2. School of Nano Sciences, Central University of Gujarat, Gandhinagar, India

3. School of Physics, University of Hyderabad, Hyderabad, India

4. Physics Department, Rajiv Gandhi University of Knowledge Technologies (RGUKT)/IIIT Basar, Telangana, India

5. Centre for Physical Sciences, Central University of Punjab, Bathinda, India

Funder

Science and Engineering Research Board

Department of Science and Technology

Publisher

Informa UK Limited

Subject

Condensed Matter Physics,General Materials Science,Nuclear and High Energy Physics,Radiation

Link

https://www.tandfonline.com/doi/pdf/10.1080/10420150.2017.1359597

Reference40 articles.

1. Design and capabilities of an experimental setup based on magnetron sputtering for formation and deposition of size-selected metal clusters on ultra-clean surfaces

2. AlN films deposited by dc magnetron sputtering and high power impulse magnetron sputtering for SAW applications

3. Growth kinetics of Al clusters in the gas phase produced by a magnetron-sputtering source

4. $\hbox{CrN}_{\rm x}$ Films Prepared by DC Magnetron Sputtering and High-Power Pulsed Magnetron Sputtering: A Comparative Study

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1. Overall aspect for designing magnetron sputtering plasma sources and their applications in the deposition of ITO films;AIP Advances;2024-05-01

2. Analysis Structural Modification and Optical–Electrical Properties of Al-Doped ZnO Oxide Films Deposited by Magnetron Sputtering;Brazilian Journal of Physics;2021-10-07

3. On the electrical properties of sputter deposited thin films: The role of energy and impurity flux;Thin Solid Films;2019-11

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