Paschen curve approach to investigate electron density and deposition rate of Cu in magnetron sputtering system-Reference-Cited by-同舟云学术

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Paschen curve approach to investigate electron density and deposition rate of Cu in magnetron sputtering system

Published:2016-12 Issue:11-12 Volume:171 Page:999-1005
ISSN:1042-0150
Container-title:Radiation Effects and Defects in Solids
language:en
Short-container-title:Radiation Effects and Defects in Solids

Author:

Gopikishan S.¹,Banerjee I.¹,Bogle K. A.²,Das A. K.³,Pathak A. P.⁴,Mahapatra S. K.⁵

Affiliation:

1. Department of Physics, Birla Institute of Technology, Ranchi, India

2. School of Physical Sciences, Swami Ramanand Teerth Marathwada University, Nanded, India

3. Department of Physics, Utkala University, Bhubaneswar, India

4. School of Physics, University of Hyderabad, Hyderabad, India

5. Centre for Physical Sciences, Central University of Punjab, Bathinda, India

Funder

BARC, Mumbai, India

BRNS

Publisher

Informa UK Limited

Subject

Condensed Matter Physics,General Materials Science,Nuclear and High Energy Physics,Radiation

Link

https://www.tandfonline.com/doi/pdf/10.1080/10420150.2016.1267734

Reference15 articles.

1. Application of magnetron sputtering for producing bioactive ceramic coatings on implant materials

2. An expanding thermal plasma for deposition of surface textured ZnO:Al with focus on thin film solar cell applications

3. High efficiency solar cell based on dye sensitized plasma treated nano-structured TiO2 films

4. Sensing characteristics of NiO thin films as NO2 gas sensor

5. Thin-film shape-memory alloy actuated micropumps

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