XLIV.The contact potential difference between clean and oxygenated tungsten-Reference-Cited by-同舟云学术

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XLIV.The contact potential difference between clean and oxygenated tungsten

Published:1935-10 Issue:134 Volume:20 Page:594-607
ISSN:1941-5982
Container-title:The London, Edinburgh, and Dublin Philosophical Magazine and Journal of Science
language:en
Short-container-title:The London, Edinburgh, and Dublin Philosophical Magazine and Journal of Science

Author:

Reimann A.L.

Publisher

Informa UK Limited

Link

http://www.tandfonline.com/doi/pdf/10.1080/14786443508561504

Reference7 articles.

1. The Thermionic Work Function and the Slope and Intercept of Richardson Plots

2. Electron Emission from Adsorbed Films on Tungsten

3. On the Increase in Surface Area due to Crystal Faces Developed by Etching

4. The Evaporation of Atoms, Ions and Electrons from Caesium Films on Tungsten

5. The Evaporation of Atoms, Ions and Electrons from Caesium Films on Tungsten

Cited by 32 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Thermogalvanische und andere Auslöse-Effekte;Landolt-Börnstein;2013

2. Studies in contact potentials : I. Determination of the surface potential of some films on tungsten and mercury by the condenser method and a new form of the thermionic method;Recueil des Travaux Chimiques des Pays-Bas;2010-09-02

3. The source for a vector polarized lithium-6 beam at the Heidelberg en-tandem;Nuclear Instruments and Methods;1977-06

4. Mean residence time of potassium ions on tungsten as measured with reference to ionization efficiency;Surface Science;1977-06

5. Surface ionization of indium and aluminum on iridium;Journal of Applied Physics;1973-05

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