High Speed Selective Jet Electrodeposition-Reference-Cited by-同舟云学术

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High Speed Selective Jet Electrodeposition

Published:1991-01 Issue:4 Volume:69 Page:119-127
ISSN:0020-2967
Container-title:Transactions of the IMF
language:en
Short-container-title:Transactions of the IMF

Author:

Booking C

Publisher

Informa UK Limited

Subject

Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Mechanics of Materials,Condensed Matter Physics

Link

https://www.tandfonline.com/doi/pdf/10.1080/00202967.1991.11870907

Reference14 articles.

1. US Patent No. 3,810,829, May 1974, James C. Fletcher, NASA.

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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2. Effect of electrolyte composition and deposition voltage on the deposition rate of copper microcolumns jet electrodeposition;Materials Science and Engineering: B;2023-12

3. Preparation of Nickel Parts by Jet Electro-Deposition Technique Based on Templates and Grinding;International Journal of Electrochemical Science;2015-08

4. Porous Metal and Method for Preparation by the Scanning and Swinging Jet Electrodeposition;International Journal of Electrochemical Science;2014-06

5. Research on Preparation of Multilayers by the Multiple Jet Electrodeposition;International Journal of Electrochemical Science;2014-01

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