The Research of Reactivity between Nano-abrasives and Sapphire during Polishing Process-Reference-Cited by-同舟云学术

The Research of Reactivity between Nano-abrasives and Sapphire during Polishing Process

Published:2015-01-02 Issue:1 Volume:159 Page:41-48
ISSN:1058-4587
Container-title:Integrated Ferroelectrics
language:en
Short-container-title:Integrated Ferroelectrics

Author:

Xu Yongchao,Lu Jing,Xu Xipeng

Publisher

Informa UK Limited

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Ceramics and Composites,Control and Systems Engineering,Electronic, Optical and Magnetic Materials

Link

http://www.tandfonline.com/doi/pdf/10.1080/10584587.2015.1029839

Reference18 articles.

1. Low temperature wet etching to reveal sub-surface damage in sapphire substrates

2. A case for 2-body material removal in prime LED sapphire substrate lapping and polishing

3. Modern trends in crystal growth and new applications of sapphire

4. Evaluation of double sided lapping using a fixed abrasive pad for sapphire substrates

5. Low temperature wet etching to reveal sub-surface damage in sapphire substrates

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5. Optimization study on magnetorheological fluid components and process parameters of cluster magnetorheological finishing with dynamic magnetic field for sapphire substrates;Smart Materials and Structures;2020-10-22