The pearson IV distribution and its application to ion implanted depth profiles
Author:
Publisher
Informa UK Limited
Subject
General Engineering
Link
http://www.tandfonline.com/doi/pdf/10.1080/00337578008209163
Reference4 articles.
1. Ion Implantation Range and Energy Deposition Distributions
2. Calculations of implanted-ion range and energy-deposition distributions:11B in Si
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