Josephson junction fabrication by means of ion implantation and electron beam lithography-Reference-Cited by-同舟云学术

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Josephson junction fabrication by means of ion implantation and electron beam lithography

Published:1980-01 Issue:1-4 Volume:47 Page:171-176
ISSN:0033-7579
Container-title:Radiation Effects
language:en
Short-container-title:Radiation Effects

Author:

Gamo K.,Namba S.

Publisher

Informa UK Limited

Subject

General Engineering

Link

http://www.tandfonline.com/doi/pdf/10.1080/00337578008209206

Reference19 articles.

1. Invited: Josephson Devices as Potential Circuit Elements in Ultra-Fast Computers

2. Richards, P. L. 1977.Semiconductors and Semi-metals, Edited by: Willardson, R. K. and Beer, A. C. Vol. 12, 395New York: Academic Press.

3. Millimeter and submillimeter wave detection and mixing with superconducting weak links

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