1. Harper, J. M. E., Cuomo, J. J., Cambino, R. J., Kaufman, H. R., Auciello, O. and Kelly, R., eds. 1984.Ion Bombardment Modification of Surfaces, 127New York: Elsevier.
2. Improved step coverage by ion beam resputtering
3. Ion–surface interactions during vapor phase crystal growth by sputtering, MBE, and plasma‐enhanced CVD: Applications to semiconductors
4. Microfabrication with ion beams
5. Sputter Depth Profiling of Microelectronic Structures