An XPS Study of the Locus of Failure Between PMDA-ODA Polyimide and SiO2Surface
Author:
Publisher
Informa UK Limited
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Mechanics of Materials,General Chemistry
Link
http://www.tandfonline.com/doi/pdf/10.1080/00218468608071227
Reference10 articles.
1. Use of X-Ray Photoelectron Spectroscopy to Study the Failure of an Adhesive Joint Between Two Polymers
2. Interfacial chemistry and adhesion: recent developments and prospects
3. Use of auger and x-ray photoelectron spectroscopy to study the locus of failure of structural adhesive joints
4. Applications of surface analysis techniques to studies of adhesion
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