On the thermal annealing behavior of boron in solids
Author:
Affiliation:
1. a Hahn-Meitner-Institute , Glienickerstr. 100, D-1000, Berlin , 39 , Germany
Publisher
Informa UK Limited
Subject
Condensed Matter Physics,General Materials Science,Nuclear and High Energy Physics,Radiation
Link
https://www.tandfonline.com/doi/pdf/10.1080/10420159008213138
Reference43 articles.
1. 5 keV to 2 MeV lithium implantation and diffusion in amorphous silicon
2. Depth profiles of Li ions implanted in the photoresist AZ111
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