Amorphization of gold film on silicon single crystal by hardness indentation at room temperature
Author:
Affiliation:
1. Faculty of Engineering, Hokkaido University, Sapporo, Japan
2. Institute for Integrated Radiation and Nuclear Science, Kyoto University, Osaka, Japan
Publisher
Informa UK Limited
Subject
Condensed Matter Physics
Link
https://www.tandfonline.com/doi/pdf/10.1080/14786435.2023.2255973
Reference27 articles.
1. Effect of indentation temperature on nickel-titanium indentation-induced two-way shape-memory surfaces
2. Microindentation response of relaxor ferroelectric PMN-0.32PT single crystal
3. Indentation-induced phase transformations in silicon: influences of load, rate and indenter angle on the transformation behavior
4. Amorphization and Conductivity of Silicon and Germanium Induced by Indentation
5. Stress-induced amorphization of silicon crystal by mechanical scratching
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