Analysis of Process Plasma via Computer Simulations and Plasma Diagnostics, for N2 Plasma and H2 Plasma

Author:

Modeling & Simulation Working G

Publisher

The Vacuum Society of Japan

Subject

Spectroscopy,Surfaces and Interfaces,Instrumentation,General Materials Science

Reference35 articles.

1. 1) International Technology Roadmap for Semiconductors 2007 Edition, (Semiconductor Industry Association, 2008)

2. 2) Semiconductor Manufacturing Equipment Technology Roadmap 2007 Edition, (Semiconductor Equipment Association of Japan, Tokyo 2008) [in Japanese]

3. 3) 三次元電磁場計算技術調査専門委員会編「電気学会技術報告(II部)第286号」電気学会(1988)

4. The Gaseous Electronics Conference radio‐frequency reference cell: A defined parallel‐plate radio‐frequency system for experimental and theoretical studies of plasma‐processing discharges

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