Large-Area Deposition Technology of High Purity Organic Thin Film by Gas Flow Deposition-Reference-Cited by-同舟云学术

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Large-Area Deposition Technology of High Purity Organic Thin Film by Gas Flow Deposition

Published:2015 Issue:3 Volume:58 Page:79-85
ISSN:1882-2398
Container-title:Journal of the Vacuum Society of Japan
language:en
Short-container-title:J. Vac. Soc. Jpn.

Author:

EDURA Tomohiko¹²,TSUGITA Kohei¹²,ADACHI Chihaya³⁴¹

Affiliation:

1. Center for Organic Photonics and Electronics Research (OPERA), Kyushu University

2. TEL Technology Center Sendai, Tokyo Electron Ltd.

3. International Institute for Carbon Neutral Energy Research (WPI-I2CNER), Kyushu University

4. Department of Applied Chemistry, Kyushu University

Publisher

The Vacuum Society of Japan

Subject

Spectroscopy,Surfaces and Interfaces,Instrumentation,General Materials Science

Reference22 articles.

1. 1) C. W. Tang, S. A. VanSlyke and C. H. Chen: J. Appl. Phys., 65 (1989) 3610.

2. 2) C. Adachi, S. Tokito, T. Tetsuo and S. Saito: Jpn. J. Appl. Phys., 27 (1998) L713.

3. 3) T. Shimizu, A. Nakamura, H. Komaki, T. Minato, H. Spreitzer and J. Kroeber: SID 03 Digest, (2003) 1290.

4. 4) S. Seki, M. Uchida, T. Sonoyama, M. Ito, S. Watanabe, S. Sakai and S. Miyashita: SID 09 Digest, (2009) 593.

5. 5) R. J. Chesterfield, K. D. Frischknecht, M. Stainer, N. Truong, M. Murai, H. Oze, A. Shiota and S. Suzuki: SID 09 Digest, (2009) 951.

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