Image Electronics; Information Sesing

Author:

Kawahito Shoji1,Takayanagi Isao2,Takahashi Hidekazu3,Sugawa Shigetoshi4,Misawa Takeshi,Ohta Jun5,Hamamoto Takayuki6,Ohtake Hiroshi7,Harada Koichi8,Onoda Atsushi9

Affiliation:

1. Research Institute of Electronics, Shizuoka University

2. Micron Japan, Ltd.

3. Device Technology Development Headquarters, Canon Inc.

4. Graduate School of Engineering, Tohoku University

5. Graduate School of Materials Science, Nara Institute of Science and Technology

6. Faculty of Engineering, Tokyo University of Science

7. NHK Science & Technical Research Laboratories

8. Sony Corp.

9. Hamamatsu Photonics Co. Ltd.

Publisher

Institute of Image Information and Television Engineers

Subject

Electrical and Electronic Engineering,Computer Science Applications,Media Technology

Reference58 articles.

1. 1) M. Iwase, at al.: "52 Mega-Pixel APS H-size CMOS Image Sensor for Super High Resolution Image Capturing", in Program of 2007 International Image Sensors Workshop, p.295 (2007)

2. 2) S. Yoshihara, et al.: "A 1/1.8-inch 6.4 Mpixel 60 frames/s CMOS Image Sensor with Seamless Mode Change", IEEE J. Solid-State Circuits, 41, 12, p.2998 (2006)

3. 3) G. Arganov, et al: "Super Small, Sub 2um Pixels for CMOS Image Sensors", in Program of 2007 International Image Sensors Workshop, p.307 (2007)

4. 4) C.R. Moon, et al.: "Dedicated Process Architecture and the Characteristics of 1.4um Pixel CMOS Image Sensor with 8M Density", 2007 Symposium of VLSI Technology, Digest of Technical Papers, p.62 (2007)

5. 5) J. Yamane, et al.: "A 1.75um Square Pixel IT-CCD Using Gate Oxide Insulator Composed by a Single Layer Electrode Structure", in Program of 2007 International Image Sensors Workshop, p.9 (2007)

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