Mass spectroscopy in ion implantation
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Published:1984
Issue:2
Volume:2
Page:145
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ISSN:0734-211X
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Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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language:en
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Short-container-title:J. Vac. Sci. Technol. B
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
3 articles.
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1. Review of secondary ion mass spectrometry characterization of contamination associated with ion implantation;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1994-07
2. SIMS analysis of isotopic impurities in ion implants;Vacuum;1986-11
3. Ion implantation in III–V materials;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1985-05