Subhalf-micron patterning of negative working resist by using new phase-shifting masks
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Published:1990-11
Issue:6
Volume:8
Page:1745
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ISSN:0734-211X
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Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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language:
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Short-container-title:J. Vac. Sci. Technol. B
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
10 articles.
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4. A novel technique for shifter void defect repair by a focused ion beam tool;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1994-11
5. Sub-0.5 micron lithography with i-line acid-hardened negative resists;Microelectronic Engineering;1992-03