1. Wavelength dependence of exposure window and resist profile in x-ray lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1994-11
2. Uniform-stress tungsten on x-ray mask membranes via He–backside temperature homogenization;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1994-11
3. Stress-induced pattern-placement errors in thin membrane masks;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1994-11
4. Microlithography: An overview;Advanced Materials for Optics and Electronics;1994-03
5. Pattern formation in amorphous WNx by low temperature electron cyclotron resonance etching for fabrication of x-ray mask;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1993-11