Improved GaAs substrate temperature measurement during molecular-beam epitaxial growth

Author:

Wright S. L.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 29 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Optical in-situ temperature management for high-quality ZnO molecular beam epitaxy;Journal of Crystal Growth;2021-03

2. Temperature mapping using single wavelength pyrometry during epitaxial growth;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2011-11

3. Measurements of parameters of the low-temperature molecular-beam epitaxy of GaAs;Semiconductors;2002-08

4. Physical and Chemical Methods for Thin-Film Deposition and Epitaxial Growth;Specimen Handling, Preparation, and Treatments in Surface Characterization;2002

5. Use of optical fiber pyrometry in molecular beam epitaxy;Journal of Crystal Growth;1997-05

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