Measurement of Cu atom density in a magnetron sputtering plasma source using an YBaCuO target by laser-induced fluorescence imaging spectroscopy
Author:
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.2353850
Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Spatial distribution of plasma parameters by a dual thermal-electrostatic probe in RF and DC magnetron sputtering discharges during deposition of aluminum doped zinc oxide thin films;Plasma Sources Science and Technology;2021-04-01
2. Spatially Resolved Optoelectronic Properties of Al-Doped Zinc Oxide Thin Films Deposited by Radio-Frequency Magnetron Plasma Sputtering Without Substrate Heating;Nanomaterials;2019-12-19
3. Absolute densities of Cu, Zn, Sn, and S atoms in magnetron sputtering plasmas employing a Cu2ZnSnS4target;Japanese Journal of Applied Physics;2016-06-15
4. Measured density of copper atoms in the ground and metastable states in argon magnetron discharge correlated with the deposition rate;Journal of Physics D: Applied Physics;2010-12-16
5. Precise Analysis of Sputtering Plasmas —Diagnostics by Laser-Induced Fluorescence—;Journal of the Vacuum Society of Japan;2010
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