Investigation of thick, low‐temperature plasma deposited silica films for waveguide fabrication-Reference-Cited by-同舟云学术

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Investigation of thick, low‐temperature plasma deposited silica films for waveguide fabrication

Published:1994-07 Issue:4 Volume:12 Page:1244-1251
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Tabasky M.,Bulat E. S.,Tweed B.,Herrick C.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.579303

Cited by 18 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Mitigating Water Absorption in Waveguides Made From Unannealed PECVD SiO2;IEEE Photonics Technology Letters;2017-05-15

2. Optical excitation and emission processes of Si-QD/SiO2 multilayer films with different SiO2 layer thicknesses;Applied Physics A;2013-04-30

3. Effects of Si-rich oxide layer stoichiometry on the structural and optical properties of Si QD/SiO2multilayer films;Nanotechnology;2009-11-04

4. Phosphorus-doped silicon quantum dots for all-silicon quantum dot tandem solar cells;Solar Energy Materials and Solar Cells;2009-09

5. Conformity of Silica-like Thin Films Deposited by Atmospheric Pressure Townsend Discharge and Transport Mechanisms;IEEE Transactions on Plasma Science;2009-06

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