Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study-Reference-Cited by-同舟云学术

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Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study

Published:2016-01 Issue:1 Volume:34 Page:01A127
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Sowińska Małgorzata,Henkel Karsten,Schmeißer Dieter,Kärkkänen Irina,Schneidewind Jessica,Naumann Franziska,Gruska Bernd,Gargouri Hassan

Funder

Deutsche Forschungsgemeinschaft (DFG)

Bundesministerium für Bildung und Forschung (BMBF)

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4936227

Cited by 22 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Conductive TiN thin films grown by plasma-enhanced atomic layer deposition: Effects of N-sources and thermal treatments;Journal of Vacuum Science & Technology A;2023-03-06

2. Tailoring thin film transistor performance through plasma reactant manipulation in indium oxynitride films;Journal of Materials Chemistry C;2023

3. Titanium Oxynitride Spheres with Broad Plasmon Resonance for Solar Seawater Desalination;ACS Applied Materials & Interfaces;2022-06-15

4. Tunable Ti³⁺-Mediated Charge Carrier Dynamics of Atomic Layer Deposition-Grown Amorphous TiO₂;The Journal of Physical Chemistry C;2022-02-25

5. Top‐Down Approach to Study Chemical and Electronic Properties of Perovskite Solar Cells: Sputtered Depth Profiling Versus Tapered Cross‐Sectional Photoelectron Spectroscopies;Solar RRL;2021-08-19

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