Hydrogen annealing effects on local structures and oxidation states of atomic layer deposited SnOx-Reference-Cited by-同舟云学术

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Hydrogen annealing effects on local structures and oxidation states of atomic layer deposited SnOx

Published:2018-05 Issue:3 Volume:36 Page:031519
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Chang Siliang¹,Vijayan Sriram²,Aindow Mark²,Jursich Gregory³,Takoudis Christos G.⁴

Affiliation:

1. Department of Chemical Engineering, University of Illinois at Chicago, Chicago, Illinois 60607

2. Department of Materials Science and Engineering, Institute of Materials Science, University of Connecticut, Storrs, Connecticut 06269-3136

3. Departments of Bioengineering and Chemistry, University of Illinois at Chicago, Chicago, Illinois 60607

4. Department of Bioengineering and Chemical Engineering, University of Illinois at Chicago, Chicago, Illinois 60607

Funder

National Science Foundation

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/am-pdf/10.1116/1.5026696

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2. SnO2 thin film deposition using atomic layer deposition technique: Properties and applications;Reference Module in Materials Science and Materials Engineering;2023

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4. Mixed Tin-Titanium Oxides by Atomic Layer Deposition on Planar Substrates: Physical and Electronic Structure;Applied Surface Science;2022-01

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