A plasma x-ray source for x-ray lithography-Reference-Cited by-同舟云学术

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A plasma x-ray source for x-ray lithography

Published:1986-01 Issue:1 Volume:4 Page:243
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:
Short-container-title:J. Vac. Sci. Technol. B

Author:

Okada I.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 41 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Soft X-ray radiation from C3H8 and N2 discharges in the divergent gas-puff z pinch;Japanese Journal of Applied Physics;2020-03-23

2. A Review of the Gas-Puff $Z$ -Pinch as an X-Ray and Neutron Source;IEEE Transactions on Plasma Science;2015-08

3. Optical Observation of the Instability in Microsecond Gas-PuffZ-Pinch Plasmas;Japanese Journal of Applied Physics;2001-02-28

4. X-Ray Lithography;Handbook of VLSI Microlithography;2001

5. Laser and Electron Beam Assisted Processing;Handbook of Thin Film Deposition Processes and Techniques;2001

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