100 kV ghost electron beam proximity correction on tungsten x-ray masks

Author:

Gesley M. A.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Photomask Fabrication;Handbook of Semiconductor Manufacturing Technology, Second Edition;2007-07-09

2. Data Preparation;Handbook of Photomask Manufacturing Technology;2005-04-07

3. Fabrication of identical sub-100 nm closely spaced parallel lines using electron beam lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2005

4. Electron Beam Proximity Effect Correction on the MEBES eXara Mask Pattern Generator;SPIE Proceedings;2002-12-24

5. Electron beam lithography for 0.13 μm manufacturing;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1997-11

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