Comparative study of ITO and TiN fabricated by low-temperature RF biased sputtering-Reference-Cited by-同舟云学术

Comparative study of ITO and TiN fabricated by low-temperature RF biased sputtering

Published:2016-03 Issue:2 Volume:34 Page:021503
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Simon Daniel K.¹,Tröger David²,Schenk Tony¹,Dirnstorfer Ingo¹,Fengler Franz P. G.¹,Jordan Paul M.¹,Krause Andreas¹,Mikolajick Thomas³

Affiliation:

1. NaMLab gGmbH, Nöthnitzerstr. 64, 01187 Dresden, Germany

2. Westsächsische Hochschule Zwickau, Fachgruppe Nanotechnologie, Dr.-Friedrichs-Ring 2a, 08056 Zwickau, Germany

3. NaMLab gGmbH, Nöthnitzerstr. 64, 01187 Dresden, Germany and TU Dresden, Institut für Halbleiter- und Mikrosystemtechnik (IHM), 01062 Dresden, Germany

Funder

European Fund for Regional Development

Free State of Saxony

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4936257

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