Direct-simulation Monte Carlo modeling of reactor-scale gas-dynamic phenomena in a multiwafer atomic-layer deposition batch reactor-Reference-Cited by-同舟云学术

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Direct-simulation Monte Carlo modeling of reactor-scale gas-dynamic phenomena in a multiwafer atomic-layer deposition batch reactor

Published:2021-09 Issue:5 Volume:39 Page:052404
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Thiruppathiraj Sudharshanaraj¹^ORCID,Ryu Seung-Min¹²,Uh Jiho²,Raja Laxminarayan L.¹^ORCID

Affiliation:

1. Department of Aerospace Engineering and Engineering Mechanics, The University of Texas at Austin, Austin, Texas 78712

2. Memory Technology Innovation Team, Samsung Electronics, 1, Samsungjeonja-ro, Hwaseong-si, Gyeonggi-do 18448, Republic of Korea

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

https://avs.scitation.org/doi/pdf/10.1116/6.0000993

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A Coaxial Nozzle Attachment Improving the Homogeneity of the Gas Flow Sputtering;Coatings;2024-02-25

2. Assessing the Environmental Impact of Atomic Layer Deposition (ALD) Processes and Pathways to Lower It;ACS Materials Au;2023-04-27

3. Diffusive separation in rarefied plume interaction;Journal of Vacuum Science & Technology B;2022-12

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