Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure-Reference-Cited by-同舟云学术

Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure

Published:2021-09 Issue:5 Volume:39 Page:053408
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Chowdhury Md. Istiaque¹^ORCID,Sowa Mark²^ORCID,Van Meter Kylie E.³^ORCID,Babuska Tomas F.³⁴,Grejtak Tomas³⁴,Kozen Alexander C.⁵^ORCID,Krick Brandon A.³⁴⁶,Strandwitz Nicholas C.¹

Affiliation:

1. Department of Materials Science and Engineering, Lehigh University, Bethlehem, Pennsylvania 18015

2. Veeco ALD, Waltham, Massachusetts 02453

3. Department of Mechanical Engineering, Florida A&M University – Florida State University College of Engineering, Tallahassee. Florida 32310-5754

4. Department of Mechanical Engineering and Mechanics, Lehigh University, Bethlehem, Pennsylvania 18015

5. Department of Materials Science and Engineering, University of Maryland, College Park, Maryland 20740

6. Aero-propulsion, Mechatronics, and Energy Center, Florida A&M University–Florida State University College of Engineering, Tallahassee, Florida 32310

Funder

Division of Civil, Mechanical and Manufacturing Innovation

Graduate Research Fellowship Program

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

https://avs.scitation.org/doi/pdf/10.1116/6.0001175

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