Stencil reticle development for electron beam projection system-Reference-Cited by-同舟云学术

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Stencil reticle development for electron beam projection system

Published:1999 Issue:6 Volume:17 Page:2864
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Kawata S.,Katakura N.,Takahashi S.,Uchikawa K.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 47 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Stencil pattern accuracy of EPL masks;SPIE Proceedings;2005-06-28

2. Masks for Electron Beam Projection Lithography;Handbook of Photomask Manufacturing Technology;2005-04-07

3. Status and issues of electron projection lithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2005-01-01

4. Status and issues of EPL;SPIE Proceedings;2004-08-20

5. Ultrathin membrane masks for electron projection lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2004

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