The Si3N4/TiN Interface: An Introduction to a Series of Ultrathin Films Grown and Analyzed In situ using X-ray Photoelectron Spectroscopy-Reference-Cited by-同舟云学术

The Si3N4/TiN Interface: An Introduction to a Series of Ultrathin Films Grown and Analyzed In situ using X-ray Photoelectron Spectroscopy

Published:2012-12 Issue:1 Volume:19 Page:30-32
ISSN:1055-5269
Container-title:Surface Science Spectra
language:en
Short-container-title:Surf. Sci. Spectra

Author:

Haasch Richard T.¹,Patscheider Jörg²,Hellgren Niklas³,Petrov Ivan¹,Greene J. E.¹

Affiliation:

1. Department of Materials Science and Frederick Seitz Materials Research Laboratory, University of Illinois, 104 S. Goodwin Avenue, Urbana, Illinois 61801, USA

2. EMPA, Laboratory for Nanoscale Materials Science, Überlandstrasse 129 CH-8600 Dübendorf, Switzerland and Department of Materials Science and Frederick Seitz Materials Research Laboratory, University of Illinois, 104 S. Goodwin Avenue, Urbana, Illinois 61801, USA

3. Department of Materials Science and Frederick Seitz Materials Research Laboratory, University of Illinois, 104 S. Goodwin Avenue, Urbana, Illinois 61801, USA and Messiah College, Department of Mathematical Sciences, P.O. Box 3041, One College Ave., Grantham, Pennsylvania 17027, USA

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

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