Simplified model for calculating the pressure dependence of a direct current planar magnetron discharge-Reference-Cited by-同舟云学术

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Simplified model for calculating the pressure dependence of a direct current planar magnetron discharge

Published:2003-07 Issue:4 Volume:21 Page:1218-1224
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Buyle G.,Depla D.,Eufinger K.,Haemers J.,De Gryse R.,De Bosscher W.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1572169

Cited by 23 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Particle-in-Cell Simulations for the Improvement of the Target Erosion Uniformity by the Permanent Magnet Configuration of DC Magnetron Sputtering Systems;Coatings;2023-04-07

2. Diagnostics of a high-pressure DC magnetron argon discharge with an aluminium cathode;The European Physical Journal D;2021-09

3. Correlation between plasma glow intensity distribution and sputtering profile in dc magnetron discharge;Journal of Physics: Conference Series;2019-01

4. Tutorial: Hysteresis during the reactive magnetron sputtering process;Journal of Applied Physics;2018-12-28

5. Effect of interelectrode distance on dc magnetron current–pressure characteristics;Journal of Physics: Conference Series;2018-01

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