Enhancing the reactivity of clean, defect-free epitaxial graphene by the substrate—Experiment and theory

Author:

Stach T.1ORCID,Seif A.2ORCID,Ambrosetti A.2ORCID,Silvestrelli P. L.2ORCID,Burghaus U.1ORCID

Affiliation:

1. Department of Chemistry and Biochemistry, North Dakota State University 1 , 1311 Albrecht Blvd. N, Fargo, North Dakota 58102

2. Dipartimento di Fisica e Astronomia, Università di Padova 2 , Via Marzolo 8, Padova 35131, Italy

Abstract

Experimental and theoretical evidence is presented that a sulfur compound dissociates on clean, defect-free epitaxial graphene (Gr) in ultrahigh vacuum (UHV). Together with density functional theory calculations (DFT), experimental kinetics and spectroscopic data suggest an auto-(/self)catalytic process. The results could open a pathway to a carbocatalyst. While adsorbing H2S in UHV at low temperatures on single-layer graphene/ruthenium (Gr/Ru), H2 desorbs and sulfur remains on the surface. Vacancy and grain boundary defects, respectively, can be excluded as active sites. DFT results indicate the importance of the Ru(0001) support in facilitating a reaction pathway with small activation energy for H2S dissociation. Gr becomes reactive due to a complex interplay of structural and electronic effects, including the corrugation of the graphene layer and the hybridization of ruthenium's d orbital with antibonding states of H2S.

Funder

Fondazione Cariparma

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

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