Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition-Reference-Cited by-同舟云学术

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Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition

Published:2021-05 Issue:3 Volume:39 Page:032415
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Wang Chen¹²,Bao Chun-Hui¹,Wu Wan-Yu³,Hsu Chia-Hsun¹,Zhao Ming-Jie¹²,Lien Shui-Yang¹²³,Zhu Wen-Zhang¹²

Affiliation:

1. School of Opto-electronic and Communication Engineering, Xiamen University of Technology, Xiamen 361024, China

2. Fujian Key Laboratory of Optoelectronic Technology and Devices, Xiamen University of Technology, Xiamen 361024, China

3. Department of Materials Science and Engineering, Da-Yeh University, Dacun, Changhua 51591, Taiwan

Funder

the scientific research project of Xiamen Universiyt of Technolog

the science and technology project of Xiamen

National Nature Science Foundation of China

Natural Science Foundation of Fujian Province

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

https://avs.scitation.org/doi/pdf/10.1116/6.0000968

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Comparison of Radio Frequency Source Designs in Inductively Coupled Plasma Systems: A Numerical Study;2024

2. Ion bombardment effect on properties of MoO thin film under different PEALD plasma exposure time;Vacuum;2022-06

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