Exposure characteristics of high-resolution negative resists
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Published:1990-11
Issue:6
Volume:8
Page:1447
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ISSN:0734-211X
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Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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language:
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Short-container-title:J. Vac. Sci. Technol. B
Author:
Chiong Kaolin Grace
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
28 articles.
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