Plasma process induced surface damage removal-Reference-Cited by-同舟云学术

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Plasma process induced surface damage removal

Published:1998-01 Issue:1 Volume:16 Page:260-264
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Brooks C. B.,Buie M. J.,Vaidya K. J.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.580980

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Process damage assessment of a low energy inductively coupled plasma-based neutral source;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2000

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