Erratum: “Low-temperature (<450 °C), plasma-assisted deposition of poly-Si thin films on SiO2 and glass through interface engineering” [J. Vac. Sci. Technol. A 15, 1035 (1997)]
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Published:1998-01
Issue:1
Volume:16
Page:207-207
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ISSN:0734-2101
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Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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language:en
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Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Author:
Wolfe D. M.,Wang F.,Habermehl S.,Lucovsky G.
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Cited by
1 articles.
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