Secondary defects engineering in c-Si: Influence of implantation dose, temperature, and oxygen concentration
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Published:2000-03
Issue:2
Volume:18
Page:717-719
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ISSN:0734-2101
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Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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language:en
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Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Author:
Poirier R.,Schiettekatte F.,Roorda S.,Fortin M. O.
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics