Similarity in interactions between metal–semiconductor and metal–metal interfaces
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Published:1982-07
Issue:2
Volume:21
Page:639-642
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ISSN:0022-5355
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Container-title:Journal of Vacuum Science and Technology
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language:en
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Short-container-title:Journal of Vacuum Science and Technology
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
12 articles.
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3. Atomistic Film Growth and Some Growth-Related Film Properties;Handbook of Physical Vapor Deposition (PVD) Processing;1998
4. Crystallization of amorphous silicon during thin‐film gold reaction;Journal of Applied Physics;1987-11
5. Ambient dependence of metal diffusion through a less‐electronegative metal layer;Applied Physics Letters;1986-11-10