Photoresist Materials and Applications-Reference-Cited by-同舟云学术

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Photoresist Materials and Applications

Published:1969-01 Issue:1 Volume:6 Page:18-24
ISSN:0022-5355
Container-title:Journal of Vacuum Science and Technology
language:en
Short-container-title:Journal of Vacuum Science and Technology

Author:

Lussow R. O.

Publisher

American Vacuum Society

Subject

General Engineering

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1492615

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Universal approach for process optimization of chemically amplified photoresists in electron beam lithography;Journal of Micro/Nanopatterning, Materials, and Metrology;2024-05-20

2. MicroLED/LED electro-optical integration techniques for non-display applications;Applied Physics Reviews;2023-05-01

3. Schrifttum;Handbuch für experimentelle Spannungsanalyse;1989

4. Besondere Verfahren;Handbuch für experimentelle Spannungsanalyse;1989

5. Negative Photoresists;Semiconductor Lithography;1988

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