Linewidth uniformity in Lloyd’s mirror interference lithography systems-Reference-Cited by-同舟云学术

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Linewidth uniformity in Lloyd’s mirror interference lithography systems

Published:2008-11 Issue:6 Volume:26 Page:2131-2134
ISSN:1071-1023
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

O’Reilly Thomas B.¹,Smith Henry I.¹

Affiliation:

1. Research Laboratory in Electronics, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Room 36-213, Cambridge, Massachusetts 02139

Publisher

American Vacuum Society

Subject

Electrical and Electronic Engineering,Condensed Matter Physics

Cited by 26 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Bending of Lloyd’s mirror to eliminate the period chirp in the fabrication of diffraction gratings;Optics Express;2024-05-03

2. Theoretical investigation on the elimination of the period chirp by deliberate substrate deformations;Optics Express;2022-06-06

3. Frontiers of light manipulation in natural, metallic, and dielectric nanostructures;La Rivista del Nuovo Cimento;2021-01

4. A review of 2D and 3D plasmonic nanostructure array patterns: fabrication, light management and sensing applications;Nanophotonics;2019-10-04

5. Use of beam-shaping optics for wafer-scaled nanopatterning in laser interference lithography;Applied Physics A;2019-04-08

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