Titanium oxide films on Si(100) deposited by e-beam evaporation-Reference-Cited by-同舟云学术

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Titanium oxide films on Si(100) deposited by e-beam evaporation

Published:2000-11 Issue:6 Volume:18 Page:2932-2936
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Jang H. K.,Whangbo S. W.,Choi Y. K.,Chung Y. D.,Jeong K.,Whang C. N.,Lee Y. S.,Lee H-S.,Choi J. Y.,Kim G. H.,Kim T. K.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1312377

Cited by 21 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Atomic Layer Deposition of Titanium Oxide-Based Films for Semiconductor Applications—Effects of Precursor and Operating Conditions;Materials;2023-08-08

2. Preparation of TiO2-x film with a high TCR performance for uncooled thermal sensor;International Conference on Sensors and Instruments (ICSI 2021);2021-07-02

3. Dual Photolytic Pathways in an Alloyed Plasmonic Near-Perfect Absorber: Implications for Photoelectrocatalysis;ACS Applied Nano Materials;2021-02-24

4. Improvement of the thermal stability of Nb:TiO2−xsamples for uncooled infrared detectors;Journal of Physics D: Applied Physics;2017-12-13

5. Bolometric properties of oxygen atmosphere annealed Nb:TiO 2−x films for infrared detectors;Ceramics International;2017-08

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