Limitations of focused ion beam nanomachining-Reference-Cited by-同舟云学术

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Limitations of focused ion beam nanomachining

Published:2001 Issue:6 Volume:19 Page:2533
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Lehrer C.,Frey L.,Petersen S.,Ryssel H.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 82 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Nanoscale Patterning of Surface Nanobubbles by Focused Ion Beam;Langmuir;2024-07-04

2. Self-probed ptychography from semiconductor high-harmonic generation;Optics Letters;2022-09-15

3. Study of the topography of silicon surface evolution under irradiation by a gallium ion beam;Vacuum;2022-09

4. Stress-strain engineering of single-crystalline silicon membranes by ion implantation: Towards direct-gap group-IV semiconductors;Physical Review Materials;2021-12-21

5. Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes;Journal of Visualized Experiments;2020-01-19

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