Quantitative analysis of borophosphosilicate glass films on silicon using infrared external reflection–absorption spectroscopy-Reference-Cited by-同舟云学术

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Quantitative analysis of borophosphosilicate glass films on silicon using infrared external reflection–absorption spectroscopy

Published:1995-07 Issue:4 Volume:13 Page:1959-1966
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Franke James E.,Zhang Lizhong,Niemczyk Thomas M.,Haaland David M.,Radigan Kenneth J.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.579636

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Complete Elemental Analysis of Low-ka-SiC:H Thin Films by Transmission FTIR Spectroscopy;ECS Journal of Solid State Science and Technology;2014

2. Grating-Coupler Assisted Infrared Reflection Absorption Spectroscopy for the Characterization of Organic Thin Films;Analytical Chemistry;2006-09-21

3. Monitoring Dielectric Thin-Film Production on Product Wafers Using Infrared Emission Spectroscopy;Applied Spectroscopy;2001-08

4. Characterization of residues formed by anhydrous hydrogen fluoride etching of doped oxides;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2001-07

5. EPR and UV-Raman study of BPSG thin films: structure and defects;Microelectronic Engineering;2001-03

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